Real-time monitoring of ellipsometry monolayer oscillations during metalorganic vapor-phase epitaxy

Citation
Js. Lee et Y. Masumoto, Real-time monitoring of ellipsometry monolayer oscillations during metalorganic vapor-phase epitaxy, J CRYST GR, 221, 2000, pp. 111-116
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
221
Year of publication
2000
Pages
111 - 116
Database
ISI
SICI code
0022-0248(200012)221:<111:RMOEMO>2.0.ZU;2-E
Abstract
Ellipsometry signal oscillations were clearly seen during metalorganic vapo r-phase epitaxy (MOVPE) of III-V materials under high sample rotation at 14 00rpm. The ellipsometric signal was found to oscillate at a period correspo nding to 1 monolayer of MOVPE growth. Oscillations correlated with the form ation of islands due to nucleation on terraces during the growth of 1 monol ayer. Layer thickness and composition of AlGaAs and InGaAs were precisely d etermined in situ. Critical layer thickness and In composition for InGaAs q uantum dot formation were also evaluated directly from in situ ellipsometry data. (C) 2000 Elsevier Science B.V. All rights reserved.