Epitaxial regrowth of AlGaInP on AlGaInP grooved structure by MOVPE

Citation
T. Fukuhisa et al., Epitaxial regrowth of AlGaInP on AlGaInP grooved structure by MOVPE, J CRYST GR, 221, 2000, pp. 208-211
Citations number
6
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
221
Year of publication
2000
Pages
208 - 211
Database
ISI
SICI code
0022-0248(200012)221:<208:EROAOA>2.0.ZU;2-M
Abstract
We present a study on the quality of AlGaInP epitaxial layers regrown on Al GaInP quaternary alloy grooved structure by low-pressure metalorganic vapor -phase epitaxy (MOVPE). The growth behavior and dislocations in the regrown layers are investigated by cross-sectional transmission electron microscop y (TEM). It is found that the dislocation density in the regrown AlGaInP ep itaxial layer depends on the growth temperature during the regrowth process . At a low growth temperature, high density of dislocations due to lattice mismatch was observed in the regrown layers. At higher temperatures, regrow n AlGaInP layers with drastically reduced dislocation density were obtained . (C) 2000 Published by Elsevier Science B.V.