We present a study on the quality of AlGaInP epitaxial layers regrown on Al
GaInP quaternary alloy grooved structure by low-pressure metalorganic vapor
-phase epitaxy (MOVPE). The growth behavior and dislocations in the regrown
layers are investigated by cross-sectional transmission electron microscop
y (TEM). It is found that the dislocation density in the regrown AlGaInP ep
itaxial layer depends on the growth temperature during the regrowth process
. At a low growth temperature, high density of dislocations due to lattice
mismatch was observed in the regrown layers. At higher temperatures, regrow
n AlGaInP layers with drastically reduced dislocation density were obtained
. (C) 2000 Published by Elsevier Science B.V.