Optical properties of undoped and modulation-doped AlxGa1-xN/GaN heterostructures grown by metalorganic chemical vapor deposition

Citation
Hk. Kwon et al., Optical properties of undoped and modulation-doped AlxGa1-xN/GaN heterostructures grown by metalorganic chemical vapor deposition, J CRYST GR, 221, 2000, pp. 362-367
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
221
Year of publication
2000
Pages
362 - 367
Database
ISI
SICI code
0022-0248(200012)221:<362:OPOUAM>2.0.ZU;2-Y
Abstract
The radiative recombination of carriers in a two-dimensional electron gas ( 2DEG) in undoped and modulation-doped AlxGa1-xN/GaN heterostructures grown by metalorganic chemical vapor deposition is investigated at low temperatur e using photoluminescence measurements. Temperature-dependent Hall effect a nd Shubnikov-de Haas measurements, verify the formation of a high-quality 2 DEG. Radiative recombination is observed between the 2DEC in quantum states at the hetero-interface and the holes in the flat-band region or bound to residual accepters both in undoped and top AlGaN layer is removed by reacti ve ion etching. In addition, the effect of the growth interruption time, la ser excitation intensity, and doping conditions upon the photoluminescence is also described. (C) 2000 Elsevier Science B.V. All rights reserved.