High-power electrically injected mid-infrared interband lasers grown by LP-MOCVD

Citation
B. Lane et M. Razeghi, High-power electrically injected mid-infrared interband lasers grown by LP-MOCVD, J CRYST GR, 221, 2000, pp. 679-682
Citations number
5
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
221
Year of publication
2000
Pages
679 - 682
Database
ISI
SICI code
0022-0248(200012)221:<679:HEIMIL>2.0.ZU;2-C
Abstract
Electrical injection. interband mid-infrared lasers emitting between 3.2 an d 4.7 mum have been grown by low-pressure metal organic chemical vapor depo sition. A double heterostructure laser based on InAsSbP emitting at 3.2 mum emits at powers up to 450 mW in continuous mode operation. Additionally, s uperlattice lasers based on the InAsSb and InAsP alloys have been used for lasers emitting from 3.8 to 4.7 mum These lasers demonstrate threshold curr ent densities as low as 67 A cm(-2) and output powers over 900 mW. (C) 2000 Elsevier Science B.V. All rights reserved.