One of the most important parameters defining the quality of silver halide
photographic materials is the covering power of the developed photographic
layers. This covering power can be determined by the structure of the devel
oped silver. It is well known that the structure of the silver filaments is
strongly affected by the surface properties of the developing grain. One o
f the methods of changing these properties is epitaxial deposition of mixed
halides onto the surface of the host grain. Transmitting electron microsco
py was implemented to study this phenomenon. Double jet technique was used
to introduce mixed silver chloride and bromide into the host emulsion conta
ining pure silver bromide octahedral, cubic and other crystals. Surface pro
perties of the host grains were thus altered in a significant way. This wor
k presents the effect of these epitaxial depositions on the maximum optical
density that was achieved upon coating the final emulsions as the light-se
nsitive photographic layers.