Effect of annealing temperature on the formation of silicides and the surface morphologies of PtSi films

Authors
Yin, YH Li, MC Zheng, YF Wang, Z Cai, W Wang, PL Zhao, LC
Citation
Yh. Yin et al., Effect of annealing temperature on the formation of silicides and the surface morphologies of PtSi films, J MAT SCI T, 17(1), 2001, pp. 39-40
Citations number
5
Categorie Soggetti
Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
ISSN journal
10050302 → ACNP
Volume
17
Issue
1
Year of publication
2001
Pages
39 - 40
Database
ISI
SICI code
1005-0302(200101)17:1<39:EOATOT>2.0.ZU;2-S
Abstract
The effect of annealing temperature on the formation of the PtSi phase, dis tribution of silicides and the surface morphologies of silicides films is i nvestigated by XPS, AFM. It is shown that the phase sequences of the films change from Pt Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2S+PtSi-PtSi- Si with an increase of annealing temperature and the reason for the formati on of mixed layers is discussed.