Electrochemically formed porous silicon (PS) can be released from the bulk
silicon substrate by underetching at increased current density. Using this
technique, two types of channels containing free-standing layers of PS were
constructed, which were called multi-walled microchannels (MW mu CS). They
can be used in devices like microsieves, microbatteries, and porous electr
odes. Two types of MW muC were made: the "conventional" version, consisting
of two or more coaxially constructed microchannels separated by a suspende
d PS membrane, and the buried variety, where a PS membrane is suspended hal
fway an etched cavity surrounded by silicon nitride walls. The latter is mo
re robust. The pore size of the PS was measured using transmission electron
microscopy and field emission gun scanning electron microscopy (FEGSEM) an
d found to be of the order of 7 nm.