T. Yoshioka et O. Ohashi, Behavior of high temperature oxidation of Ti(Al, X)(3)(X=Mn, Cr, Ag, Cu) and diffusion of TiAl/Ti(Al, X)(3) joints, J JPN METAL, 64(11), 2000, pp. 1127-1132
TiAl intermetallic compound has attracted considerable interest for their p
otential as new heat-resisting material, because of its lightness and high
strength at elevated temperature. Using TiAl as automobile engine parts and
so on, it is necessary to modify the oxidation resistance. On the other ha
nd, TiAl3 has more excellent oxidation resistance than TiAl, but it is too
brittle to be a structural material. Tt has been reported that the crystal
structure of TiAl3 changes from D0(22) type into Lit type due to the additi
on of the third element X.
This study was carried out considering that L1(2) type Ti(Al, X)(3) is used
as a coating material on the TiAl. The purpose of this study is to investi
gate the effects of the additional third element X on the properties of coa
ting layer that provides the TiAl with high temperature oxidation resistanc
e.
Manganese, chromium, silver and copper were chosen as the additional elemen
t in this study.
Vickers hardness of the Ti(AI, X)(3), in which X is Mn, Cr or Ag, becomes s
imilar value to that of TiAl. From this result, these materials may be good
for the coating layer.
From the oxidation test, it was found that all the four materials have more
excellent oxidation resistance than TiAl and they can play a role of coati
ng layer that provides the TiAl with high temperature oxidation resistance.
Especially, Mn or Ag added material has good oxidation resistance.
From the observation of diffusion behavior of TiAl/Ti(Al, X)(3) diffusion c
ouple, it was found that phase separation occurs in the Ti(AI, X)(3) materi
al added with Ag or Cu. In the case of Mn or Cr added Ti(AI, X)(3), the con
centration of each element changes gradually and no intermediate phase form
s at the interface. The growth rate of the diffusion layer of Mn added Ti (
AI, X)(3) material is lower than that of Cr added material. The lower the g
rowth rate of the diffusion layer is, the more effective it is for the coat
ing layer.
From these results, it is considered that Mn added Ti(Al, X)(3) material is
most suitable for the coating layer that provides the TiAl with high tempe
rature oxidation resistance among the four materials.