Quantification of a radical beam source for methyl radicals

Citation
T. Schwarz-selinger et al., Quantification of a radical beam source for methyl radicals, J VAC SCI A, 19(1), 2001, pp. 101-107
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
19
Issue
1
Year of publication
2001
Pages
101 - 107
Database
ISI
SICI code
0734-2101(200101/02)19:1<101:QOARBS>2.0.ZU;2-N
Abstract
A radical beam source for methyl radicals (CH3) was characterized applying ionization-threshold mass spectrometry. The beam source is based on thermal dissociation of methane (CH4) or azomethane (N-2(CH3)(2)) in a heated tung sten capillary. A flux of (3+/-1)X10(13) cm(-2)s(-1) CH3 radicals is produc ed using methane as precursor gas and a capillary temperature of 1650 K. Al ternatively, a flux of (3+/-1)X10(14) cm(-2) s(-1) CH3 is produced using az omethane as precursor gas and a capillary temperature of 1150 K. The domina nt production of methyl from the precursor methane occurs due to reaction 2 CH4+M-->2 CH3+H-2+M at the hot tungsten surface. The dominant production o f methyl from azomethane occurs due to the reaction N-2(CH3)(2)-->2 CH3+N-2 . Besides methyl radicals, only stable molecules contribute to the emitted flux; within the detection limit, no atomic hydrogen is observed. From the comparison of ionization-threshold mass spectrometry and standard mass spec trometry, it is concluded that the cracking pattern of methane varies with the methane gas temperature. This is explained by the vibrational assisted dissociation of methane. (C) 2001 American Vacuum Society. [DOI: 10.1116/1. 1326939].