Enhanced coercivity by substrate bias configuration in Co-based alloy thinfilm

Using the substrate bias configuration in a single sputtering process, Go-b ased alloy triple-layer magnetic thin films were deposited. A coercivity in crease was obtained in both room-temperature-deposited and high-temperature -deposited (300 degreesC) films, and the coercivity was optimized in a NB-B -NB (NB: no bias and B: bias applied in sputtering) type of bias configurat ion. Dislocation and voids introduced by bias sputtering and the diffusion at the grain boundary and interfaces were proposed to explain the improveme nt of coercivity. The bias-configured sputtering triple-magnetic-layer stru cture was suggested as a new approach to improve the magnetic properties, w hich maintain the advantage of multi-magnetic-layer media. (C) 2001 America n Vacuum Society.