T. Matsushita et R. Kamide, Five cases of photocontact dermatitis due to topical ketoprofen: photopatch testing and cross-reaction study, PHOTODERM P, 17(1), 2001, pp. 26-31
Background: In parallel with the popular usage of topical ketoprofen, the n
umber of reported cases of ketoprofen-induced photoallergic contact dermati
tis has been increasing. It is clinically important to know the cross-react
ivity of ketoprofen in order to avoid cross-sensitization caused by several
structurally similar non-steroidal anti-inflammatory drugs (NSAID) on the
market.
Methods: To evaluate the spectrum of cross sensitization, photopatch testin
g was performed on five patients with ketoprofen-induced photoallergic cont
act dermatitis using ketoprofen and other structurally similar chemicals, s
uch as oxybenzone, tiaprofenic acid and suprofen.
Results: All five patients reacted positively to ketoprofen or ketoprofen p
laster on photopatch testing. All four patients photopatch tested with rela
ted chemicals showed cross-photosensitization with tiaprofenic acid and sup
rofen, However, none of the patients reacted positively to oxybenzone.
Conclusion: Either the diphenylketone moiety or a structurally similar tiop
hene-phenylketone moiety is important as the antigenic determinants of keto
profen photoallergy, The arylpropionic acid side chain would not be involve
d.