P. Veluchamy et al., A pyrosol process to deposit large-area SnO2 : F thin films and its use asa transparent conducting substrate for CdTe solar cells, SOL EN MAT, 67(1-4), 2001, pp. 179-185
Highly transparent, low-resistance SnO2 :F films suitable as a substrate ma
terial for thin-film CdS/CdTe solar cells have been developed on 10 x 10, 3
0 x 60 and 82 x 71cm(2) glass substrates by an ultrasonic spray pyrolysis (
pyrosol) process. Dimethyltin dichloride, NH,F and HF dissolved in water se
rved as the source solution. A fine spray of the source solution has been t
ransported using air as a carrier gas onto hot glass plates in a belt furna
ce maintained at 500-530 degreesC. A very high growth rate of > 15 nm/s and
a high throughput of 3 min/glass plate (82 x 71cm(2) size) have been achie
ved with films showing greater uniformity, low sheet resistance and high op
tical transmission. Typical films exhibited a thickness of 500 nm, a sheet
resistance of 8.1 Omega /sq., a mobility of 43.8 cm(2)/V s and a donor conc
entration of 3.5 x 10(20) cm(-3). A thin-film CdS/CdTe solar cell fabricate
d on a 30 x 60 cm(2) SnO2:F transparent conducting substrate exhibited a so
lar energy conversion efficiency maximum of 14.95% for 1 cm(2) cell and an
average efficiency of 14.24% for 178 isolated 1 cm(2) cells. (C) 2001 Elsev
ier Science B.V. All rights reserved.