Plasma-based ion implantation (PBII) of nitrogen into chrome plated-steel i
s discussed with regard to dimensional homogeneity, depth distribution and
the possibility of combining different implantation modes. A stainless hold
er with 60 X 10 mm(2) trenches at depths of 60, 40, 20 and 10 mm was made.
The chromium-plated steel plates were fixed on the bottom of the trenches a
nd treated by PBII under various conditions. The depth profiles and chemica
l bonds were measured with X-ray photoelectron spectroscopy (XPS) combined
with Ar sputtering. The primary results confirmed that nitrogen PBII could
introduce a significant amount of nitrogen into the chrome-plated layers in
a shorter time than a conventional beam-line implanter. The implanted nitr
ogen was observed to combine with chromium. The depth profiles of nitrogen
were the same for samples set on holder surfaces both facing and reversed t
o the RF source, which suggested homogeneous implantation in all directions
. The PBII treatment was found to be homogenous for the trenches with an as
pect ratio less than 4 without sample manipulation. A rapid elevation in te
mperature occurred during PBII treatment. Control of the target temperature
remains as a future challenge. (C) 2001 Elsevier Science B.V. All rights r
eserved.