Monitoring of ion mass composition in plasma immersion ion implantation

A system to monitor the ion mass and charge state as well as plasma potenti al value during plasma immersion ion implantation and deposition ((PID)-D-3 ) has been developed. It was tested with a 30-kV (PID)-D-3 setup using hot cathode DC (HC) and inductively coupled RF (ICP) discharge sources alternat ively. The ion mass analyzer has a moderate resolution at approximately 30, provides ion sampling from different points within the plasma volume, and is adaptable to various plasma devices. The design and performance of the s ystem will be described, and experimental results in nitrogen and argon pla smas produced by the modular HC-ICP source will be discussed. (C) 2001 Else vier Science B.V. All rights reserved.