K. Takaki et al., Determination of heat and ion fluxes in plasma immersion ion implantation by in situ measurement of temperature using laser interferometry, SURF COAT, 136(1-3), 2001, pp. 261-264
Temperature rises of a birefringent substrate (LiNbO3)with repetitive negat
ive pulse bias have been measured in a capacitively coupled RF argon plasma
. The measurement method is based on monitoring the variation in natural bi
refringence due to the changed temperature by interferometry. Using this me
thod, the dependence of the substrate temperature rise upon the repetition
rate of the pulse bias has been investigated. A negative bias of - 800 V wa
s applied in a series of pulses with repetition rates of 400-800 Hz and a d
uration of 35 mus using a pulse modulator. The heat flux increases with the
repetition rate of the bias pulse. At 800 Hz the value is nearly equal to
40% of the power applied to the pulse modulator. (C) 2001 Published by Else
vier Science B.V. All rights reserved.