Extraction of ions from the matrix sheath in ablation-plasma ion implantation

Citation
B. Qi et al., Extraction of ions from the matrix sheath in ablation-plasma ion implantation, APPL PHYS L, 78(6), 2001, pp. 706-708
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
6
Year of publication
2001
Pages
706 - 708
Database
ISI
SICI code
0003-6951(20010205)78:6<706:EOIFTM>2.0.ZU;2-S
Abstract
A simple one-dimensional theory is presented to assess the implantation of ions from the ion matrix sheath (IMS) in an ablated plasma plume that is ap proaching a negatively biased substrate. Under the assumption that the plum e geometry, the electron and ion density distributions, and the potential d istribution are frozen during the IMS extraction, the implanted ion current is calculated as a function of time for various substrate-plume separation s. This model accurately recovers Lieberman's classic results when the plum e front is initially in contact with the substrate. (C) 2001 American Insti tute of Physics.