Resistivity and electromigration were investigated for thin sputtered Ag fi
lms and microstructured Ag lines. Resistivities of thin films were found to
be lower compared to copper and follow the prediction of the size effect.
Microstructured Ag lines show a high electromigration resistance at acceler
ated stress measurements. Considering joule heating of the lines, the activ
ation energy for electromigration was found to be 0.58 eV. The extrapolated
median lifetime of Ag lines was found to be similar or higher than for Cu
lines. (C) 2001 American Institute of Physics.