Polarization behavior during porous silicon formation: effect of surfactant

Citation
T. Tsuboi et al., Polarization behavior during porous silicon formation: effect of surfactant, ELECTR ACT, 46(7), 2001, pp. 1013-1018
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
46
Issue
7
Year of publication
2001
Pages
1013 - 1018
Database
ISI
SICI code
0013-4686(20010115)46:7<1013:PBDPSF>2.0.ZU;2-I
Abstract
The effect of surfactant on the polarization behavior during porous silicon formation has been studied for p- and p(+)-type silicon wafers. The presen ce of surfactant showed strong effects on p-type silicon, whereas the pi-ty pe silicon polarization curve changed negligibly with a surfactant. The ani onic surfactant increased the overpotential; it was decreased by the cation ic surfactant. The space charge layer mainly determines the dissolution pro cess, since p-type silicon, which has a smaller capacity, was more affected than p(+)-type silicon. This is also supported by the capacity measurement s of a p-type silicon: a more positive flatband potential in the anionic su rfactant solution and a less positive flatband potential in the cationic on e. The surface properties of p-type porous silicon have also been investiga ted by infrared spectroscopy. The absorption bands change in shape and in i ntensity, depending upon the surfactant. In particular, the cationic surfac tant reduced the absorbance. The decrease is due to the chemical dissolutio n of the porous silicon layer. We can also see a correlation between the in tegrated absorbance and the electrode potential. (C) 2001 Elsevier Science Ltd. All rights reserved.