Temperature-dependent small-signal and noise parameter measurements and modeling on InPHEMTs

Citation
Mr. Murti et al., Temperature-dependent small-signal and noise parameter measurements and modeling on InPHEMTs, IEEE MICR T, 48(12), 2000, pp. 2579-2587
Citations number
18
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
ISSN journal
00189480 → ACNP
Volume
48
Issue
12
Year of publication
2000
Pages
2579 - 2587
Database
ISI
SICI code
0018-9480(200012)48:12<2579:TSANPM>2.0.ZU;2-U
Abstract
In this paper, we present detailed on-wafer S-parameter and noise parameter measurements and modeling of InP/InAlAs/InGaAs high electron mobility tran sistors (0.1-mum gate length) at cryogenic temperatures, Various physical e ffects influencing small-signal parameters, especially the radio-frequency (RF) transconductance and RF output resistance and their temperature depend ence, are discussed in detail. Accurate on-wafer noise parameter measuremen ts are carried out from 300 to 18 K, and the variation of the equivalent no ise temperatures of drain and source (T-d and T-g) are modeled against temp erature. Based on these models, a cryogenic low-noise amplifier in the Ka-b and is developed with a record-low noise temperature of 10 K.