Mr. Murti et al., Temperature-dependent small-signal and noise parameter measurements and modeling on InPHEMTs, IEEE MICR T, 48(12), 2000, pp. 2579-2587
Citations number
18
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
In this paper, we present detailed on-wafer S-parameter and noise parameter
measurements and modeling of InP/InAlAs/InGaAs high electron mobility tran
sistors (0.1-mum gate length) at cryogenic temperatures, Various physical e
ffects influencing small-signal parameters, especially the radio-frequency
(RF) transconductance and RF output resistance and their temperature depend
ence, are discussed in detail. Accurate on-wafer noise parameter measuremen
ts are carried out from 300 to 18 K, and the variation of the equivalent no
ise temperatures of drain and source (T-d and T-g) are modeled against temp
erature. Based on these models, a cryogenic low-noise amplifier in the Ka-b
and is developed with a record-low noise temperature of 10 K.