Designing two-dimensional electron gases in GaAs/InGaAs/AlGaAs, delta-doped AlGaAs/GaAs, and AlGaAs/InGaAs/GaAs heterostructures for single electron transistor application

Citation
Y. Fu et al., Designing two-dimensional electron gases in GaAs/InGaAs/AlGaAs, delta-doped AlGaAs/GaAs, and AlGaAs/InGaAs/GaAs heterostructures for single electron transistor application, J APPL PHYS, 89(3), 2001, pp. 1759-1763
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
3
Year of publication
2001
Pages
1759 - 1763
Database
ISI
SICI code
0021-8979(20010201)89:3<1759:DTEGIG>2.0.ZU;2-4
Abstract
We have theoretically studied two types of two-dimensional electron gases ( 2DEGs) in GaAs/ InGaAs/AlGaAs and delta -doped-AlGaAs/GaAs heterostructures for single-electron transistor applications by self-consistently solving t he Schrodinger and Poisson equations. Assuming the dominant effect of the i onized impurity scattering in determining the low-held carrier mobility, it has been shown that introducing an InGaAs layer to the conventional GaAs/A lGaAs heterostructure greatly increases the sheet density of the 2DEG and t he corresponding carrier mobility. The delta -doped AlGaAs/GaAs and AlGaAs/ InGaAs/GaAs heterostructures provide us with an even better control of the 2DEG with higher sheet density and carrier mobility. (C) 2001 American Inst itute of Physics.