Study of ion desorption induced by carbon core excitation for poly-methylmethacrylate thin film using electron-ion coincidence spectroscopy

Citation
E. Ikenaga et al., Study of ion desorption induced by carbon core excitation for poly-methylmethacrylate thin film using electron-ion coincidence spectroscopy, J CHEM PHYS, 114(6), 2001, pp. 2751-2759
Citations number
50
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CHEMICAL PHYSICS
ISSN journal
00219606 → ACNP
Volume
114
Issue
6
Year of publication
2001
Pages
2751 - 2759
Database
ISI
SICI code
0021-9606(20010208)114:6<2751:SOIDIB>2.0.ZU;2-7
Abstract
We have developed a new electron-ion coincidence apparatus combined with sy nchrotron radiation in order to examine the various ion desorption mechanis ms related to the Auger process induced by core excitation. Photon stimulat ed ion desorption (PSID) of a poly-methylmethacrylate (PMMA) thin film has been investigated by this apparatus. The PSID of PMMA induced by carbon cor e excitation has been examined using Auger electron yield, total ion yield, resonant Auger electron, and Auger electron-photoion coincidence (AEPICO) spectra. The spectrum of the total ion yield divided by the Auger electron yield shows that the desorption efficiency is largely increased at the reso nant excitation of carbon 1s electron in the O-CH3 side chain to sigma*(O-C H3) orbital. In AEPICO measurement, H+ and CHn+ (n = 1-3) ions are observed at various resonant excitations. The AEPICO signal intensity depends on th e Auger electron energy. Particularly, the CH3+ ion desorption in coinciden ce with Auger electron at 270 eV shows strong enhancement with sigma*(O-CH3 ) resonant excitation. The results of the resonant Auger spectra and AEPICO yield spectra demonstrate the relation of the ion desorption mechanism to the bonding/antibonding character and localized character of the excited si gma*(O-CH3) orbital and the Auger final state. (C) 2001 American Institute of Physics.