Ch. Lei et al., Structural investigation of the epitaxial yittria-stabilized zirconia films deposited on (001) silicon by laser ablation, J CRYST GR, 222(3), 2001, pp. 558-564
Yittria-stabilized zirconia (YSZ) films doped with 3 and 9 vol%. Y2O3, resp
ectively, are epitaxially deposited on (0 0 1) silicon substrates by means
of pulsed laser deposition (PLD) technique. Transmission electron microscop
y (TEM) and X-ray diffraction are mainly combined to study the film microst
ructure. It is: found that the film structure strongly depends on the amoun
t of Y2O3 dopant. 99/0 Y2O3-doped films display a near cubic structure; 45
degrees 1/2(1 1 0) dislocations are the main defects in the film and therma
l cracks are formed during cooling. The 3% Y2O3-doped films are dominated b
y {1 1 0} twin-related tetragonal domains in which monoclinic phase is foun
d. The films are free of thermal cracks even for films thicker than 2 mum.
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