Recent developments in fluorine chemistry for microelectronic applications- Some examples at Comurhex

Citation
A. Jourdan et B. Morel, Recent developments in fluorine chemistry for microelectronic applications- Some examples at Comurhex, J FLUORINE, 107(2), 2001, pp. 255-264
Citations number
49
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
JOURNAL OF FLUORINE CHEMISTRY
ISSN journal
00221139 → ACNP
Volume
107
Issue
2
Year of publication
2001
Pages
255 - 264
Database
ISI
SICI code
0022-1139(200102)107:2<255:RDIFCF>2.0.ZU;2-K
Abstract
High purity fluorides are very important for microelectronic applications. In this article, we have reviewed how to prepare, handle and analyse such p roducts as WF6 and ClF3, respectively, a tungsten precursor for metal inter connects and an efficient cleaning agent. Material choice and passivation c oupled with high performance analytical studies are the key factors to main tain the highest required purity. This methodology can be extended to other reactive fluorochemicals. (C) 2001 Elsevier Science B.V. All rights reserv ed.