The adsorption of 6-dibutyl-amino-1,3,5-triazine-2,4-dithiol on metal surfaces by the conventional vacuum deposition

Films of 6-dibutylamino-1,3,5-triazine-2,4-dithiol (DB) were formed on a me tal substrate by the conventional vacuum deposition method. Molecular struc tures of adsorbed DB were investigated using XPS to examine the influence o f substrates on adsorbed gases, and the thickness of oxidized films. The me tal substrates were baked under an ultra high vacuum condition to remove ad sorbed gases, oxidized under an ambient atmosphere to give oxidized films, and subjected to deposition of metal to prepare a clean substrate. The resu lts showed that DB easily formed disulfide bonds and mercaptide bonds to ga ses adsorbed on the substrate. The chemical reactions of the substrate occu rred with an increase in OH group and adsorped H2O. and the reactions were independent of the thickness of oxidized film. As for the depositing metal, C, N, and S of DB were shown to be bound to the surface by XPS, It is assu med that the adsorption on the surface occurred through the triazine ring.