Micropatterning of NdBa2Cu3O thin films using a KrF excimer laser

The effects of laser irradiation for the micropatterning of NdBa2Cu3O super conducting thin films have been investigated. A mask imaging method with a pulsed KrF excimer laser was used. The surrounding area of the etched regio n of 100-200 mum in diameter was observed to turn white by SEM observation. The Cu 2p and O 1s photoelectron spectra fi-om this region by XPS clearly differed from the normal region. The zero-resistivity temperature of the Nd Ba2Cu3O film was decreased from 81 K for before patterning to 72.0 K. This was attributed to the dissociation of O- ions from the film's surface by la ser irradiation. The optimum energy density for minimizing the influence of oxide thin films was found to be 0.26 J cm(-2) Oxygen-controlled annealing after patterning was effective to recover T-c.