Enhanced copper K-alpha radiation from a low-energy plasma focus

Citation
M. Zakaullah et al., Enhanced copper K-alpha radiation from a low-energy plasma focus, APPL PHYS L, 78(7), 2001, pp. 877-879
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
7
Year of publication
2001
Pages
877 - 879
Database
ISI
SICI code
0003-6951(20010212)78:7<877:ECKRFA>2.0.ZU;2-N
Abstract
A low-energy (2.3 kJ) plasma focus is operated in an enhanced Cu K-alpha li ne emission mode. The emission is dominated by the interaction of electrons in the current sheath with the anode tip. The Cu K-alpha line radiation of 0.4 J/sr is recorded in the side-on direction, which steadily increases in the end-on direction and attains the value of 0.8 J/sr. It is estimated ab out 40 J of energy is radiated as x rays, out of which 8 J is in the form o f Cu K-alpha lines in 4 pi geometry. The radiation yield represents a syste m efficiency of 1.7% for overall x-ray emission, and 0.35% for the Cu K-alp ha line. (C) 2001 American Institute of Physics.