Preparation of highly (100)-oriented metallic LaNiO3 films on Si substrates by a modified metalorganic decomposition technique

Authors
Meng, XJ Sun, JL Yu, J Ye, HJ Guo, SL Chu, JH
Citation
Xj. Meng et al., Preparation of highly (100)-oriented metallic LaNiO3 films on Si substrates by a modified metalorganic decomposition technique, APPL SURF S, 171(1-2), 2001, pp. 68-70
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
171
Issue
1-2
Year of publication
2001
Pages
68 - 70
Database
ISI
SICI code
0169-4332(20010201)171:1-2<68:POH(ML>2.0.ZU;2-1
Abstract
LaNiO3 thin films were deposited on Si substrates by a modified metalorgani c decomposition technique using lanthanum nitrate and nickel acetate as the start sources. The structures of the films were characterized by X-ray dif fraction and scanning electron microscope. Highly (1 0 0)-oriented LaNiO3 f ilms with smooth and crack-free surfaces were obtained using rapid thermal annealing method. The resistivity versus temperature curves of the textured LaNiO3 films showed that the films possessed good metallic character. (C) 2001 Elsevier Science B.V. All rights reserved.