The characteristics of some metallic oxides prepared in high vacuum by ionbeam sputtering

The characteristics of ion beam sputtered metallic oxides deposited in high vacuum are analyzed by X-ray diffractometer. atomic force microscopy, spec trophotometer and ellipsometer. The metallic oxide thin films include alumi num oxide, niobium oxide, silicon oxide, tantalum oxide, zirconium oxide, a nd titanium oxide. The structure, surface morphology and optical constant a re described. An oxide film with low surface roughness, low extinction coef ficient and high packing density is crucial for an optical application. We found that to make such a high quality film there is an optimum deposition condition and an optimum post-baking temperature. Moreover, the optimum dep osition condition and the optimum post-baking temperature are different for different metallic oxides. (C) 2001 Elsevier Science B.V. All rights reser ved.