Impurity-free vacancy diffusion technique for InGaAsP/InP multiple quantumwell laser structure

Citation
Dj. Han et al., Impurity-free vacancy diffusion technique for InGaAsP/InP multiple quantumwell laser structure, CHIN PHYS L, 18(1), 2001, pp. 100-102
Citations number
8
Categorie Soggetti
Physics
Journal title
CHINESE PHYSICS LETTERS
ISSN journal
0256307X → ACNP
Volume
18
Issue
1
Year of publication
2001
Pages
100 - 102
Database
ISI
SICI code
0256-307X(2001)18:1<100:IVDTFI>2.0.ZU;2-8
Abstract
Bandgap tuning of the InGaAsP/InP multiple quant um well (MQW) laser struct ure by the impurity-free vacancy diffusion (IFVD) is investigated using pho toluminescence. It has been demonstrated that the effects of the plasma bom bardment to the:sample surface involved in the IFVD technique can enhance t he intermixing of the InGaAsP/InP MQW laser structure. The reliability of t he IFVD technique, particularly the effects of the surface decomposition an d the intrinsic defects formed in the growth or preparation of the wafer, h as been discussed.