Nanofabrication: Conventional and nonconventional methods

Authors
Citation
Y. Chen et A. Pepin, Nanofabrication: Conventional and nonconventional methods, ELECTROPHOR, 22(2), 2001, pp. 187-207
Citations number
243
Categorie Soggetti
Chemistry & Analysis
Journal title
ELECTROPHORESIS
ISSN journal
01730835 → ACNP
Volume
22
Issue
2
Year of publication
2001
Pages
187 - 207
Database
ISI
SICI code
0173-0835(200101)22:2<187:NCANM>2.0.ZU;2-#
Abstract
Nanofabrication is playing an ever increasing role in science and technolog y on the nanometer scale and will soon allow us to build systems of the sam e complexity as found in nature. Conventional methods that emerged from mic roelectronics are now used for the fabrication of structures for integrated circuits, microelectro-mechanical-systems, microoptics and microanalytical devices. Nonconventional or alternative approaches have changed the way we pattern very fine structures and have brought about a new appreciation of simple and low-cost techniques. We present an overview of some of these met hods, paying particular attention to those which enable large-scale product ion of lithographic patterns. We preface the review with a brief primer on lithography and pattern transfer concepts. After reviewing the various patt erning techniques, we discuss some recent application issues in the fields of microelectronics, optoelectronics, magnetism as well as in biology and b iochemistry.