Stripe-patterned garnet films on substrates with ion-beam-bombarded micropatterns

Authors
Okamura, Y Yahamoto, S
Citation
Y. Okamura et S. Yahamoto, Stripe-patterned garnet films on substrates with ion-beam-bombarded micropatterns, JPN J A P 2, 39(12B), 2000, pp. L1294-L1296
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
39
Issue
12B
Year of publication
2000
Pages
L1294 - L1296
Database
ISI
SICI code
Abstract
We report the selected-area epitaxy (SAE) of rare-earth iron garnet crystal line and amorphous straight ridge patterns with 8 mum width deposited on Gd 3Ga5O12 substrates. The samples were fabricated by a sputter cpitaxial meth od on substrates that were partially etched by ion-beam bombardment. We fou nd that the stripe pattern direction significantly affects the crystallogra phic formation of the side wall of the grown ridge.