RELATIONSHIP BETWEEN POROUS SILICON FORMATION AND HYDROGEN INCORPORATION

Citation
P. Allongue et al., RELATIONSHIP BETWEEN POROUS SILICON FORMATION AND HYDROGEN INCORPORATION, Thin solid films, 297(1-2), 1997, pp. 1-4
Citations number
21
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
297
Issue
1-2
Year of publication
1997
Pages
1 - 4
Database
ISI
SICI code
0040-6090(1997)297:1-2<1:RBPSFA>2.0.ZU;2-2
Abstract
Secondary ion mass spectroscopy was used to study the incorporation of deuterium into Si during the formation of porous silicon in fluoride D2O-based solutions. Results show that the deuterium diffuses from the pore tips towards the bulk silicon and remains in the pore walls in a high concentration. Measurements of the thickness of porous silicon s uggest that the penetration of H species is a necessary condition for the porous Si layer to form. A simple model illustrates how the initia tion of pores occurs by selective dissolution of H-induced structural defects. (C) 1997 Elsevier Science S.A.