Secondary ion mass spectroscopy was used to study the incorporation of
deuterium into Si during the formation of porous silicon in fluoride
D2O-based solutions. Results show that the deuterium diffuses from the
pore tips towards the bulk silicon and remains in the pore walls in a
high concentration. Measurements of the thickness of porous silicon s
uggest that the penetration of H species is a necessary condition for
the porous Si layer to form. A simple model illustrates how the initia
tion of pores occurs by selective dissolution of H-induced structural
defects. (C) 1997 Elsevier Science S.A.