THE LIMITS OF MACROPORE ARRAY FABRICATION

The formation of pore arrays with high aspect ratios by electrochemica l etching of n-type silicon in hydrofluoric acid is a well established technique. The macropore morphology depends sensitively on the anodiz ation conditions such as current density, etching time, HF concentrati on, temperature and bias as well as on substrate properties such as do ping density and orientation. The limits of feasible pore geometries a nd pore patterns and their dependence on formation conditions will be discussed in this work. (C) 1997 Elsevier Science S.A.