X-RAY-DIFFRACTION AND ELECTRON-MICROSCOPY INVESTIGATION OF POROUS SI1-XGEX

Citation
D. Buttard et al., X-RAY-DIFFRACTION AND ELECTRON-MICROSCOPY INVESTIGATION OF POROUS SI1-XGEX, Thin solid films, 297(1-2), 1997, pp. 233-236
Citations number
15
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
297
Issue
1-2
Year of publication
1997
Pages
233 - 236
Database
ISI
SICI code
0040-6090(1997)297:1-2<233:XAEIOP>2.0.ZU;2-A
Abstract
A structural study of p- and p(+)-type porous Si1-xGex materials and a comparison with non-porous epitaxial Si1-xGex layers is reported. The pore morphology is studied by electron microscopy and compared to tha t of porous silicon. It is shown that the shape of the porous structur e is similar to that of porous silicon but with preferential etching n ear the threading dislocations. In order to investigate the influence of the porosity on the crystalline structure, high-resolution X-ray di ffraction is used to determine the strains in the layer. Moreover asym metric Bragg reflection gives the value of the lattice parameter of th e layer, parallel to the sample surface. It appears that the porosific ation has only a weak influence on the crystalline structure of the Si 1-xGex layers. (C) 1997 Elsevier Science S.A.