Y. Yoshida et al., IN-SITU CHARACTERIZATION OF MORPHOLOGY OF ORGANIC THIN-FILMS BY TOTAL-REFLECTION X-RAY-ANALYSIS, Molecular crystals and liquid crystals science and technology. Section A, Molecular crystals and liquid crystals, 294, 1997, pp. 67-70
In situ characterization of the morphology of organic thin films was n
ewly attempted by using total reflection X-ray analysis (TRXA). Due to
cover a substrate with organic molecules during deposition, the inten
sity of total reflection fluorescence X-rays from a substrate surface
decreases. It is expected that the decrement depends on the morphology
of thin films. Fullerene (C60) thin films on the silver (Ag) substrat
es were formed at the substrate temperatures of 17, 50 and 100 degrees
C. From a result of in situ observation for the fluorescence Xrays of
Ag substrates by TRXA, the intensity steeply decreased at 17 degrees
C and was saturated at 50 and 100 degrees C. It was confirmed that the
decay curve indicates the ratio of the coverage of C60 and the growth
mode of island or layer-by-layer.