H. Shin et al., Formation and characterization of crystalline iron oxide films on self-assembled organic monolayers and their in situ patterning, J MATER RES, 16(2), 2001, pp. 564-569
Crystalline and pore-free films of alpha -Fe2O3 were prepared on hydrophili
c self-assembled organic monolayers (DTT-SAMs) at 80 degreesC, Subsequently
, Fe3O4 and gamma -Fe2O3 films were synthesized via post annealing of as-de
posited alpha -Fe2O3. In situ patterning of crystalline iron oxide thin lay
ers was achieved via microcontact printing (mu CP) and selective deposition
. mu CP was used to pattern two different surface moieties of self-assemble
d organic monolayers (SAMs) on Au-Cr-Si substrates. An elastomeric stamp wa
s used to transfer either hexadecanethiol (HDT) SAMs, which are to sustain
deposition of iron oxide precipitates, or hydrophilic SAMs [e.g., dithiothr
eitol (DTT)]. Selective deposition was realized through precipitation of ir
on oxide phases. Iron oxide films were deposited onto hydrophilic SAMs, but
not onto HDT surfaces. Line (width of <1 <mu>m) patterns in crystalline al
pha -Fe2O3 thin films were obtained.