Formation and characterization of crystalline iron oxide films on self-assembled organic monolayers and their in situ patterning

Citation
H. Shin et al., Formation and characterization of crystalline iron oxide films on self-assembled organic monolayers and their in situ patterning, J MATER RES, 16(2), 2001, pp. 564-569
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
16
Issue
2
Year of publication
2001
Pages
564 - 569
Database
ISI
SICI code
0884-2914(200102)16:2<564:FACOCI>2.0.ZU;2-E
Abstract
Crystalline and pore-free films of alpha -Fe2O3 were prepared on hydrophili c self-assembled organic monolayers (DTT-SAMs) at 80 degreesC, Subsequently , Fe3O4 and gamma -Fe2O3 films were synthesized via post annealing of as-de posited alpha -Fe2O3. In situ patterning of crystalline iron oxide thin lay ers was achieved via microcontact printing (mu CP) and selective deposition . mu CP was used to pattern two different surface moieties of self-assemble d organic monolayers (SAMs) on Au-Cr-Si substrates. An elastomeric stamp wa s used to transfer either hexadecanethiol (HDT) SAMs, which are to sustain deposition of iron oxide precipitates, or hydrophilic SAMs [e.g., dithiothr eitol (DTT)]. Selective deposition was realized through precipitation of ir on oxide phases. Iron oxide films were deposited onto hydrophilic SAMs, but not onto HDT surfaces. Line (width of <1 <mu>m) patterns in crystalline al pha -Fe2O3 thin films were obtained.