Molecular rulers for scaling down nanostructures

A method of constructing <30-nanometer structures in close proximity with p recise spacings is presented that uses the step-by-step application of orga nic molecules and metal ions as size-controlled resists on predetermined pa tterns, such as those formed by electron-beam lithography. The organic mole cules serve as a ruler for scaling down a Larger "parent" structure. After metal deposition and Lift-off of the organic multilayer resist, an isolated smaller structure remains on the surface. This approach is used to form th in parallel wires (15 to 70 nanometers in width and 1 micrometer long) of c ontrolled thickness and spacing. The structures obtained were imaged with f ield emission scanning electron microscopy. A variety of nanostructures cou ld be scaled down, including structures with hollow patterns.