STM studies of 1-D noble metal growth on silicon

Citation
Aa. Baski et al., STM studies of 1-D noble metal growth on silicon, ULTRAMICROS, 86(1-2), 2001, pp. 23-30
Citations number
19
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
86
Issue
1-2
Year of publication
2001
Pages
23 - 30
Database
ISI
SICI code
0304-3991(200101)86:1-2<23:SSO1NM>2.0.ZU;2-V
Abstract
Our scanning tunneling microscopy (STM) studies show that noble metals (Ag, Au) Form a wide variety of I-D structures on the high-index Si(5 5 12) sur face. At coverages below 0.25 monolayer (ML), both metals grow as overlayer rows: with an inter-row spacing of similar to 5nm. At higher coverages and annealing temperatures, the underlying Si reconstruction is removed, but p eriodic row structures persist. Au can also induce faceting to nearby plane s, e.g. (7 7 15) and (2 2 5), at temperatures above 500 degreesC. For all c overages and annealing temperatures studied here (0.02-1 ML. 450-800 degree sC), the Si(5 5 12) template initiates I-D growth of the deposited noble me tals, (C) 2001 Elsevier Science B.V. All rights reserved.