New developments in ICP-MS

The demands on analytical chemists who analyze metal samples are becoming i ncreasingly more exacting. The demands include ultrahigh throughput for a w ide range of samples, high sub-ppt sensitivity, information on speciation, and all at a lower cost. In this environment, the instrument of choice has become the ICP-MS. The series of instruments described in this article has been designed to meet today's requirements. All models are based on the sam e mainframe but with different features and software to meet the specific n eeds of various industries and applications.