Laser ablation and micropatterning of thin TiN coatings

Citation
Tv. Kononenko et al., Laser ablation and micropatterning of thin TiN coatings, APPL PHYS A, 71(6), 2000, pp. 627-631
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
71
Issue
6
Year of publication
2000
Pages
627 - 631
Database
ISI
SICI code
0947-8396(200012)71:6<627:LAAMOT>2.0.ZU;2-T
Abstract
Laser ablation of thill TIN films deposited on steel substrates has been st udied under wide-range variation of irradiation conditions (pulsewidth, wav elength, energy density and spot size). It has been demonstrated that both picosecond (150-300 Ds) and nanosecond (5-9 ns) laser pulses were suitable for controllable ablation and microstructuring of a 1-mum-thick TiN film un like longer 150-ns pulses. The ablation rate was found to be practically in dependent of the wavelength (270-1078 nm) and pulsewidth (150 ps-9 ns), but it increased substantially when the size of a laser spot was reduced from 15-60 mum to 3 mum. The laser ablation technique was applied to produce mic rostructures in the thin TiN films consisting of microcraters with a typica l size of 3-5 mum in diameter and depth less than 1 mum Tests of lubricated sliding of the laser-structured TiN films against a steel ball showed that the durability of lubricated sliding increased by 25% as compared to that of the original TiN film.