Al and Ag diffusion study in alpha-titanium

The diffusion of implanted Al and Ag in alpha -Ti has been studied in the 9 48 - 1073 and 823 - 1073 K temperature ranges by using the nuclear reaction analysis and Rutherford backscattering techniques, respectively. The measu rements show that for both solutes, the diffusion coefficients follow a lin ear Arrhenius plot, the characteristic diffusion parameters D-0 and Q being the following: for Al, D-0 = (1.4 +/- 1.2) x 10(-2) m(2) s(-1) and Q = 326 +/- 10 kJ/mol and for Ag, D-0 = (1 +/- 0.75) x 10(-4) m(2) s(-1) and Q = 2 79 +/- 6 kJ/mol. The above parameters are typical of a normal substitutiona l behavior.