Citation
Pf. Hsu et al., Self-reducible Cu-II source reagents for the CVD of copper, CHEM VAPOR, 7(1), 2001, pp. 28
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907
→ ACNP
Volume
7
Issue
1
Year of publication
2001
Database
ISI
SICI code
0948-1907(200101)7:1<28:SCSRFT>2.0.ZU;2-#
Abstract
High purity copper metal is deposited from highly volatile copper complexes
at temperatures near 250 degreesC. SEM shows a dense microstructure and re
latively small grain size (see Figure), with one of the complexes producing
copper with a measured electrical resistivity of 3.4 mu Omega cm, very clo
se to the physical resistivity value of bulk copper and copper with a purit
y of over 99 %.