Time-resolved in-situ spectroscopic monitoring of the CVD of tin oxide onto a glass substrate

Citation
Rj. Holdsworth et al., Time-resolved in-situ spectroscopic monitoring of the CVD of tin oxide onto a glass substrate, CHEM VAPOR, 7(1), 2001, pp. 39-43
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
7
Issue
1
Year of publication
2001
Pages
39 - 43
Database
ISI
SICI code
0948-1907(200101)7:1<39:TISMOT>2.0.ZU;2-J
Abstract
Near-infrared diode laser absorption spectroscopy has been demonstrated as an in-situ, non-invasive probe for use with a CVD reactor. The technique ha s been applied to the CVD of tin oxide onto a glass substrate, and by monit oring the evolution of methane in the reactor, it has been shown that the c oncentration of methane is correlated with the deposition rate of the tin o xide film. This illustrates the powerful possibilities for monitoring thin film production and properties, in-situ, during deposition.