Rj. Holdsworth et al., Time-resolved in-situ spectroscopic monitoring of the CVD of tin oxide onto a glass substrate, CHEM VAPOR, 7(1), 2001, pp. 39-43
Near-infrared diode laser absorption spectroscopy has been demonstrated as
an in-situ, non-invasive probe for use with a CVD reactor. The technique ha
s been applied to the CVD of tin oxide onto a glass substrate, and by monit
oring the evolution of methane in the reactor, it has been shown that the c
oncentration of methane is correlated with the deposition rate of the tin o
xide film. This illustrates the powerful possibilities for monitoring thin
film production and properties, in-situ, during deposition.