Study of the four-wave mixing diffraction efficiency of longitudinal-fieldmultiple-quantum-well photorefractive device grown at low temperature

Authors
Lu, Y Li, CY Zhang, YF Huang, Q Fu, PM Zhang, ZG Lu, LB Chen, HZ Qu, CZ Tang, JX
Citation
Y. Lu et al., Study of the four-wave mixing diffraction efficiency of longitudinal-fieldmultiple-quantum-well photorefractive device grown at low temperature, CHIN PHYS, 10(2), 2001, pp. 121-123
Citations number
4
Categorie Soggetti
Physics
Journal title
CHINESE PHYSICS
ISSN journal
10091963 → ACNP
Volume
10
Issue
2
Year of publication
2001
Pages
121 - 123
Database
ISI
SICI code
1009-1963(200102)10:2<121:SOTFMD>2.0.ZU;2-4
Abstract
We investigate the relationship between the beam intensity and the four-wav e mixing diffraction efficiency of the longitudinal-field multiple-quantum- well (LMQW) photorefractive device grown at low temperature. A optimum beam intensity is found. We also explain the different mechanisms of the beam i ntensity effect on the diffraction efficiency of the LMQW device and the tr ansverse-field MQW device. Some advice on how to improve the diffraction ef ficiency is given.