W. Qafsaoui et al., Pitting corrosion of copper in sulphate solutions: inhibitive effect of different triazole derivative inhibitors, J APPL ELEC, 31(2), 2001, pp. 223-231
The inhibitive effect of 3-amino 1,2,4-triazole (ATA) on the pitting corros
ion of copper induced by sulphate ions was compared to that obtained with b
enzotriazole (BTAH) and 1-hydroxybenzotriazole (BTAOH) and to previous resu
lts obtained in chloride media. It was concluded that the inhibitive action
of these compounds towards pitting corrosion was dependent on the aggressi
ve species. For BTAH and BTAOH, the inhibitive efficiency was greater towar
ds pitting induced by sulphate than towards pitting induced by chloride whi
ch was explained by referring to the surface area covered by the organic mo
lecules and to the size of the aggressive species. For ATA, an opposite beh
aviour was observed and was explained by quantum chemical calculations. Fir
st, the binding energy between clusters of Cu+ ions and Cl- was much weaker
than that between clusters of Cu+ ions and SO42-. Secondly, the adsorption
of Cl- on ATA linked to copper ions was more favourable than its adsorptio
n on copper oxide. Moreover, the sulphate ion had a larger adsorption energ
y on copper ions than on ATA linked to copper ions.