Dynamic scaling for a competitive growth process: random deposition versusballistic deposition

A random-ballistic deposition model where particles are aggregated accordin g to the rules of ballistic deposition with probability p and following a r andom deposition process with probability 1 - p, respectively, is proposed and studied. Based on extensive numerical simulations a dynamic scaling ans atz for the interface width W(L, t, p) as a function of lattice side L, tim e t and p is formulated. Three new exponents, which can be linked to the st andard growth exponent of ballistic deposition by means of a new scaling re lation, are identified.