Comment on "Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit"

Citation
Gs. Agarwal et al., Comment on "Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit", PHYS REV L, 86(7), 2001, pp. 1389-1389
Citations number
1
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
86
Issue
7
Year of publication
2001
Pages
1389 - 1389
Database
ISI
SICI code
0031-9007(20010212)86:7<1389:CO"IOL>2.0.ZU;2-V