SILICON DIODES IN AVALANCHE PULSE-SHARPENING APPLICATIONS

Citation
Rj. Focia et al., SILICON DIODES IN AVALANCHE PULSE-SHARPENING APPLICATIONS, IEEE transactions on plasma science, 25(2), 1997, pp. 138-144
Citations number
17
Categorie Soggetti
Phsycs, Fluid & Plasmas
ISSN journal
00933813
Volume
25
Issue
2
Year of publication
1997
Pages
138 - 144
Database
ISI
SICI code
0093-3813(1997)25:2<138:SDIAPA>2.0.ZU;2-O
Abstract
Silicon diodes operated in an avalanche breakdown mode can be used to reduce, or sharpen, the rise times of driving pulses, Proper operation of a diode in this manner requires the application of a driving pulse with sufficient time rate of change of voltage dV/dt. The rapidly cha nging reverse bias produces an electron-hole plasma of sufficient dens ity that the electric field strength in the n region of a p(+)-n-n(+) structure is significantly reduced and the plasma is essentially trapp ed, In effect, the plasma generation causes the device to transition f rom a high-impedance state to a low-impedance state in a short period of time, and thus acts as a fast closing switch, This paper provides a n overview of this mode of operation, A simplified theory of operation is presented, A comparison is made among the results of numerical mod eling, the theory of operation of the silicon avalanche shaper (SAS) d iode, and the theory of operation of the trapped-plasma avalanche-trig gered transit (TRAPATT) mode of operation of a diode. Based on the res ults of numerical modeling, conclusions are drawn on what factors most greatly affect the performance of avalanche shaper diodes, and one op timized design is provided.