Temperature dependence of the breakdown voltage for reverse-biased GaN p-n-n(+) diodes

Citation
Rl. Aggarwal et al., Temperature dependence of the breakdown voltage for reverse-biased GaN p-n-n(+) diodes, SOL ST COMM, 117(9), 2001, pp. 549-553
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
117
Issue
9
Year of publication
2001
Pages
549 - 553
Database
ISI
SICI code
0038-1098(2001)117:9<549:TDOTBV>2.0.ZU;2-D
Abstract
The temperature dependence of the breakdown voltage V-B, due to impact ioni zation at high electric fields, for reverse-biased GaN p-n-n(+) diodes has been measured at temperatures T between 98 and 248 K. The observed increase of V-B with T is in excellent agreement with a simple model for the scatte ring of carriers by phonons with an effective energy of 42 meV. The impact ionization coefficients for the electrons and holes are nearly equal, and t heir geometric mean has the value 4 x 10(4) cm(-1) at the breakdown electri c fields, in good agreement with recent theoretical results for 300 K. (C) 2001 Elsevier Science Ltd. All rights reserved.