Wc. Wang et al., Investigation of InP/InGaAs superlattice-emitter resonant tunneling bipolar transistors (RTBTs), SUPERLATT M, 29(2), 2001, pp. 111-119
An InP/InGaAs superlattice-emitter resonant tunneling bipolar transistor (S
E-RTBT) has been fabricated and demonstrated. The influence of the superlat
tice and emitter thickness on the device characteristics is studied. The in
sertion of the superlattice and a well-designed emitter improve the charact
eristics of the SE-RTBT. Common-emitter current gains up to 170 and 54 are
obtained for the studied devices with emitter thicknesses of 800 Angstrom a
nd 150 Angstrom, respectively. Based on the specified structure, the lower
offset voltage and saturation voltage (less than or equal to1.5 V) are obta
ined. Experimentally, the device with a 5-period superlattice and an emitte
r thickness of 800 Angstrom provides higher dc performance and stable tempe
rature-dependent characteristics. (C) 2001 Academic Press.